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DATA SHEET IL3480-XX 100mA, Quasi Low-Dropout Voltage Regulator 3 2 FEATURES: u 3.3, 5V versions available u 30V maximum input for operation u 1.2V guaranteed maximum dropout over full load and temperature ranges u 100 mA guaranteed minimum load current APPLICATION: u Tiny alternative to 78LXX series and similar devices u Low-Dropout Voltage Regulator u Post regulator for switching DC/DC converter u Bias supply for analog circuits TYPICAL APPLICATION CIRCUIT X Chip size:1.1x 0.95 2 mm Y 1 TR PAD LOCATION Pad No. Pad Name X Y 1 2 3 Note: GND Output Input 92 899 92 107 747 747 *Co-ordinates (bottom left co-ordinates comer), m 2 *Padsize: 96x96 m PHISICAL CHARACTERISTICS Wafer Diameter...... 100 0.5 mm; Wafer thickness ..... 280 20m; Scribe width ............80 m; Metallization: Top... Al Bottom... without metallization ABSOLUTE MAXIMUM RATINGS Input Voltage Junction Temperature 35V +150C ELECTRICAL CHARACTERISTICS IL3480-3.3, IL3480-5.0 Typicals and limits appearing in normal type apply for TA = TJ = 25C. Limits appearing in boldface type apply over the entire junction temperature range for operation, -10 to +70C. (Notes 1, 2) Nominal Output Voltage (VNOM) 3.3V 5.0V Units Parameter Symbol Conditions Min Typ Max Min Typ Max Output Voltage Line Regulation Vout Vout Vout IGND IGND Vin=Vnom+1.5V; 1mIout100m Vnom+1.5V Vin30V; Iout =1mA Vin=Vnom+1.5V; 1mIout100m Vin=30V No Load Vnom+1.5V Vin20V, Iout =40mA; Vin=Vnom+5V, 1mIout40m Iout =10mA; Iout =100mA 3.17 3.14 3.3 3.43 3.46 25 50 4.8 4.75 5.0 5.2 5.25 25 50 V mV mV mA m m V Load Regulation Ground Pin Current Ground Pin Current Change 3 4 1.4 0.5 0.9 1.0 1.1 1.2 3 4 1.4 0.5 0.9 1.0 1.1 1.2 Dropout Voltage VinVout Note 1: A typical is the center of characterization data taken with TA = TJ = 25C. Typicals are not guaranteed. Note 2: All limits are guaranteed. All electrical characteristics having room-temperature limits are tested during production with TA = TJ = 25C. All hot and cold limits are guaranteed by correlating the electrical characteristics to process and temperature variations and applying statistical process control. |
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